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Ion scattering system "ACOLISSA" (TOF-LEIS)

Ion scattering system ACOLISSA for studying surfaces and ultra-thin films

Figure 1
Photograph of the ion scattering system ACOLISSA (left panel) and of the sample holder (right panel)

The UHV-system ACOLISSA combines a Rutherford Backscattering (RBS) system and a high resolution low energy ion scattering TOF-spectrometer (TOF-LEIS). ACOLISSA was constructed for the purpose of studying charge exchange processes for noble gas ions at metal surfaces, and for characterization of ultra thin films (composition, growth). The sample is mounted on a three axes-manipulator (two rotations, one tilt, three translations) which permits to analyse polycrystalline and single crystal samples at ambient or elevated temperatures (300 K to 1200 K).
All mechanical components are home built. TOF-LEIS is an analytical tool that provides information on the composition of ultra thin films with excellent depth resolution. ACOLISSA also includes an Auger Electron Spectrometer (AES), a Low Energy Electron Diffraction (LEED) system and an electron beam evaporator with three deposition sources for different materials. The samples are inserted into ACOLISSA via a load-lock system.

For more information please contact: Peter Bauer or Daniel Primetzhofer