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Metal Cluster UHV chamber (METCLUST)

UHV chamber for deposition and nano-patterning of metal surfaces

Figure 1
UHV chamber "MetClust" for deposition and nano-patterning of metal surfaces

This chamber is currently used for deposition of metal clusters on insulating substrates (PET, saphhire) [1,2] and for nano-patterning of metal surfaces by ion beam bombardment. The growth and sputtering experiments can be monitored in real-time by optical spectroscopy (RDS, SE).

Experimental equipment attached to the chamber includes (1) a differentially pumped scanning ion beam sputter gun, (2) two strain-free windows for real-time Spectroscopic Ellipsometry (SE) measurements, (3) one strain-free window for real-time Reflectance Difference Spectroscopy (RDS) measurements, (4) an Ion Beam Assistant Deposition (IBAD) source, (5) a Quartz Crystal Microbalance (QCM).

With a load-lock system, the sample can be exchanged quickly. Once on the sample holder in UHV, the sample can be positioned by the x-y-z linear motion, tilt and rotation provided by the manipulator.

For more information please contact: Günther Weidlinger or Lidong Sun

References:

  1. J.M. Flores-Camacho, L.D. Sun, N. Saucedo-Zeni, G. Weidlinger, M. Hohage, P. Zeppenfeld
    Optical anisotropies of metal clusters supported on a birefringent substrate
    Phys. Rev. B 78 (2008) 075416
  2. J.M. Flores-Camacho, L.D. Sun, N. Saucedo-Zeni, G. Weidlinger, M. Hohage, P. Zeppenfeld
    In-line characterization of metal clusters supported on a birefringent substrate using reflectance difference spectroscopy
    Appl. Phys. A 98 (2010) 499